Polarizing exposure apparatus using a polarizer and method for f

Details Polarizing exposure apparatus using a polarizer and method for f Polarizing exposure apparatus using a polarizer and method for f

1992-03-02

1993-09-14

Lerner, Martin

Optical: systems and elements

Polarization without modulation

Polarization by reflection or refraction

264 13, 359489, G02B 2728, G02B 530, B29D 1100

Patent

active

052454703

ABSTRACT:
The present invention relates to a polarizing exposure apparatus using a polarizer for radiating polarized light on a polarizing mask and a method for a polarizing mask, for improved resolution, by using such a polarizing exposure apparatus. The polarizing exposure apparatus using a polarizer comprises a light source for radiating light, a pair of polarizing plates for respectively polarizing light radiated from the light source, a focusing lens for focusing the light polarized through said polarizing plates, a polarizing mask for passing only light of the desired pattern from the polarized light focused through the focusing lens and a reduction projection lens for forming the pattern on a wafer by reducing the light passed through the polarizing mask. The method for fabrication of a polarizing mask comprises a step of depositing a Chromium layer on a quartz substrate, patterning the Cr layer to form a Cr mask, forming a first polarizing film, etching said first polarizing film by using a photosensitive film, forming a second polarizing film to cover said first polarizing film and etching said second polarizing film to be alternatively formed with said first polarizing film. The present invention can improve resolution by using a simple polarizing exposure apparatus and it can fabricate a mask by conventional CAD techniques.

REFERENCES:
patent: 2316643 (1943-04-01), Yule
patent: 2440102 (1948-04-01), Land
patent: 4937459 (1990-06-01), Ina
patent: 5070250 (1991-12-01), Komatsu et al.
patent: 5072126 (1991-12-01), Progler

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