Polarization analyzing system, exposure method, and method...

Details Polarization analyzing system, exposure method, and method... Polarization analyzing system, exposure method, and method...

2009-04-09

2010-12-28

Lauchman, L. G (Department: 2877)

Optics: measuring and testing

By polarized light examination

C430S030000, C430S311000, C430S394000, C430S312000

Reexamination Certificate

active

07859665

ABSTRACT:
A polarization analyzing system includes a data collector collecting information on resist patterns formed over step patterns by first and second lights, the first and second lights being polarized parallel and perpendicular to the step patterns, a residual resist analyzer obtaining first and second relations between a ratio of a space to a line width of the resist patterns and the first and second residues, the first and second residues remaining at orthogonal points of the step patterns and the resist patterns, and a direction chooser choosing an optimum polarization direction reducing residues by comparing the first and second relations.

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Notice of Grounds for Rejection issued by the Japanese Patent Office on Dec. 19, 2006, for Japanese Patent Application No. 2004-33376, and English-language translation thereof.

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