X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1983-10-17
1985-06-25
Smith, Alfred E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 83, G01N 2320
Patent
active
045258538
ABSTRACT:
Point source X-ray focusing device structures, materials and methods of forming them are provided which exhibit a greatly increased total reflected intensity for a desired X-ray wavelength of interest. The devices include one or more focusing elements which each have a focusing surface with a plurality of layer pairs formed thereon. The focusing surface and the layer pairs are designed to collect, reflect and concentrate the maximum X-ray flux from a point source to a focus point for a particular wavelength of interest.
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Keem John E.
Marshall Gerald F.
Energy Conversion Devices Inc.
Norris Lawrence G.
Smith Alfred E.
Wieland Charles
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