Point diffraction interferometer and exposure apparatus and...

Details Point diffraction interferometer and exposure apparatus and... Point diffraction interferometer and exposure apparatus and...

2007-12-04

2007-12-04

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By light interference

Having wavefront division

C356S499000, C356S494000, C356S515000

Reexamination Certificate

active

11064558

ABSTRACT:
A point diffraction interferometer measures optical performance of a target optical system based on a light intensity distribution of an interference fringe through an interference between a wave front that passes the target optical system and a reference wave front generated from a pinhole, wherein the pinhole satisfies 1.05≦ellipticity≦1.16, where the ellipticity is defined as a diameter of a pinhole in a direction perpendicular to a linear polarization direction of light incident upon the pinhole, divided by a diameter of the pinhole in the linear polarization direction.

REFERENCES:
patent: 5076695 (1991-12-01), Ichihara
patent: 5457533 (1995-10-01), Wilcken
patent: 5835217 (1998-11-01), Medecki
patent: 2002/0044287 (2002-04-01), Otaki
patent: 2002/0191195 (2002-12-01), Ichihara et al.
patent: 57-064139 (1982-04-01), None
patent: 2-228505 (1990-02-01), None
patent: 2001-227909 (2001-08-01), None

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