Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1980-09-15
1983-02-22
Douglas, Winston A.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204188, C10G 3302, B01D 1706
Patent
active
043747248
ABSTRACT:
A desalter/dehydrater having a plurality of electrified coalescing stages in a single vessel wherein the stages are isolated hydraulically to allow parallel or serial stage operation and the emulsion being treated is introduced at one side of the vessel and caused to flow to the opposite side between horizontal planar permeable electrodes. In one embodiment, several electrical stages are operated in parallel to increase vessel throughput capacity. In another embodiment, series operation is employed, wherein each successive stage receives the product from the preceding stage as feed, with fresh water being added. The number of stages is one less than the number of the electrodes.
REFERENCES:
patent: 2375590 (1945-05-01), Schonberg et al.
patent: 2681311 (1954-06-01), De Wit
patent: 2775640 (1956-12-01), Steeves
patent: 2825686 (1958-03-01), Greene et al.
patent: 2846389 (1958-08-01), Downing et al.
patent: 2880158 (1959-03-01), Turner
patent: 2884375 (1959-04-01), Seelig et al.
patent: 3458429 (1969-07-01), Watson et al.
patent: 3649516 (1972-03-01), Cole et al.
patent: 3672127 (1972-06-01), Mayse et al.
patent: 3674677 (1972-07-01), Roberts
patent: 3812027 (1974-05-01), Jarvis et al.
patent: 4149958 (1979-04-01), Martin
patent: 4182672 (1980-01-01), Martin
Douglas Winston A.
Glass Hyman F.
Leader William
Petrolite Corporation
Ring Sidney B.
LandOfFree
Plural stage desalting/dehydrating apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plural stage desalting/dehydrating apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plural stage desalting/dehydrating apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1372339