Platinum source compositions for chemical vapor deposition of pl

Details Platinum source compositions for chemical vapor deposition of pl Platinum source compositions for chemical vapor deposition of pl

1996-06-28

1998-07-21

Nazario-Gonzalez, Porfirio

Organic compounds -- part of the class 532-570 series

Organic compounds

Heavy metal containing

427587, C07F 1500

Patent

active

057837163

ABSTRACT:
A platinum source reagent liquid solution, comprising:

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Koplitz, Lynn Vogel et al.; "Laser-Driven Chemical Vapor Deposition of Platinum at Atmospheric Pressure and Room Temperature from C.rho.Pt(CH.sub.3).sub.3," Appl. Phys. Lett. 53(18),31 Oct. 1988, pp. 1705-1707.
Chen, Yea-jer et al.,"Low-Temperature Organometallic Chemical Vapor Deposition of Platinum,"Appl. Phys. Lett. 53(17), 24 Oct. 1988, pp. 1591-1592/.
Xue, Ziling et al.,"Organometallic Chemical Vapor Deposition of Platinum. Reaction Kinetics and Vapor Pressures of Precursors," Chem. Mater. 1992,4, pp. 162-166.
Dryden, Neil H. et al.,"Chemical Vapor Deposition of Platinum: New Precursors and Their Properties,"Chem. Mater. 1991,3, pp. 677-685.
Xue, Ziling et al.,"Characterization of(Methylcyclopentadienyl)trimethylplatinum and Low-Temperature Organometallic Chemical Vapor Depositon of Platinum Metal,"J. Am. Chem. Soc., 1989, III,8779-8784.
Zin, Alfred A. et al.,"Chemical Vapor Deposition of Platinum, Palladium and Nickel," chapter 7 of The Chemistry of Metal CVD,T. Kodas et al., editors, VCH Publishers, New York, 1994, pp. 329-355.
Rand, M.J., Electronchem. Soc., 1973, 120, p. 686.
Kumar, R., et al., Polyhedron, 1989,8,p. 551.

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