Platinum film resistor device

Electrical resistors – With base extending along resistance element – Resistance element coated on base

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204192F, 204192D, 204192EC, 73295, 73362AR, 338309, 338 25, H01C 702, G01F 2324, G01K 718, C23C 1500

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041298489

ABSTRACT:
A platinum film resistor device and method for making the same. A layer of quartz, deposited upon an insulative substrate preferably silicon, is sputter etched at high power levels to produce etch pits in the surface thereof. A layer of platinum is then deposited over the quartz layer by first sputtering platinum at high power for a relatively short period of time and then completing the layer by continuing to sputter deposit platinum at a lower power. A second layer of quartz is deposited over the layer of platinum and the second layer of quartz masked and chemically etched away in the regions where portions of the platinum layer are to be removed. The exposed platinum and a portion of the second quartz layer are then sputter etched away leaving the platinum in a predetermined configuration. The platinum is then annealed, the second quartz layer removed above the lead bonding pads, and external leads attached. The device is particularly useful in temperature measuring application.

REFERENCES:
patent: 3400066 (1968-09-01), Caswell et al.
patent: 3669861 (1972-06-01), Cash, Jr. et al.
patent: 3833410 (1974-09-01), Ang et al.
patent: 3845443 (1974-10-01), Fisher
patent: 4072593 (1978-02-01), Diehl et al.
Bolker, B. F. T. and Sidles, P. H.; Thin-Film Platinum Resistance Thermometers--Fabrication and Use; J. Vac. Sci. Technol., vol. 14, No. 1, Jan./Feb. 1977, pp. 205-209.

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