Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Depositing predominantly single metal coating
Reexamination Certificate
2006-12-12
2006-12-12
Wong, Edna (Department: 1753)
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Depositing predominantly single metal coating
C205S291000, C106S001260
Reexamination Certificate
active
07147767
ABSTRACT:
The present invention provides plating solutions having either copper bis(perfluoroalkanesulfonyl) imides or copper tris(perfluoroalkanesulfonyl) methides and methods of electrochemically or chemically depositing copper interconnects using these plating solutions.
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Boyd Steven D.
Kesari Susrut
Lamanna William M.
Parent Michael J.
Zazzera Lawrence A.
3M Innovative Properties Company
Wong Edna
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