Plating rate monitor

Details Plating rate monitor Plating rate monitor

1983-12-16

1984-10-30

Lusignan, Michael R.

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

204228, 204406, 204434, 324DIG1, 364468, 364500, 364563, C23C 300, C23C 302

Patent

active

044799802

ABSTRACT:
A plating rate monitor includes a Wheatstone bridge, one branch of which is a monitoring resistor formed on a printed circuit board located in the same environment as an object being plated. The resistor undergoes plating at the same rate as the object. Each time the bridge becomes balanced, another resistor branch of the bridge, which is variable, is incremented by a preselected value to upset the balance. As the monitoring resistor in the plating environment undergoes plating, a change in its resistance causes the bridge to become balanced once again and the time interval for achieving this balance, for a calculated plating thickness change of the monitoring resistor, determines the plating rate.

REFERENCES:
patent: 2978364 (1961-04-01), Blaustein
patent: 3669868 (1972-06-01), Lieber et al.
patent: 4350717 (1982-09-01), Araki et al.

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