Plating rack

Chemistry: electrical and wave energy – Apparatus – Electrolytic

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204297W, C25D 1708

Patent

active

050788523

ABSTRACT:
A plating rack for use in electroplating at least one substrate includes a rack body onto which the subtrate may be placed; a metal ring connected to the rack body so as to surround a substrate placed on the rack body; and bistable, single-tipped cam assemblies for holding a placed substrate in place and for making electrical contact between the metal ring and the substrate.

REFERENCES:
patent: 3939056 (1976-02-01), Fueki et al.
patent: 4043894 (1977-08-01), Gibbs
patent: 4100054 (1978-07-01), DuRocher
patent: 4297197 (1981-11-01), Salman
patent: 4540478 (1985-09-01), Mallock et al.
patent: 4561960 (1985-12-01), Jeannot et al.
patent: 4595484 (1986-07-01), Takiar et al.
patent: 4714535 (1987-12-01), Coombes, Jr. et al.
patent: 4801367 (1989-01-01), Burgess
patent: 4971676 (1990-11-01), Doue et al.
Mehdizadeh et al., "Optimization of Electrodeposit Uniformity by the Use of Auxiliary Electrodes", Journal of the Electrochemical Society, vol. 137, No. 1, Jan. 1990, pp. 110-117.
"Electroplating Machine Systems for Lab Protection", by International Micro Industries (IMI), P.O. Box 604, Cherry Hill, N.J. 08003, Rev. B, Aug. 16, 1989.

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