Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1990-10-12
1992-01-07
Valentine, Donald R.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204297W, C25D 1708
Patent
active
050788523
ABSTRACT:
A plating rack for use in electroplating at least one substrate includes a rack body onto which the subtrate may be placed; a metal ring connected to the rack body so as to surround a substrate placed on the rack body; and bistable, single-tipped cam assemblies for holding a placed substrate in place and for making electrical contact between the metal ring and the substrate.
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Mehdizadeh et al., "Optimization of Electrodeposit Uniformity by the Use of Auxiliary Electrodes", Journal of the Electrochemical Society, vol. 137, No. 1, Jan. 1990, pp. 110-117.
"Electroplating Machine Systems for Lab Protection", by International Micro Industries (IMI), P.O. Box 604, Cherry Hill, N.J. 08003, Rev. B, Aug. 16, 1989.
Wehrly, Jr. James D.
Yee Ian Y. K.
Microelectronics and Computer Technology Corporation
Valentine Donald R.
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