Plating processing device

Details Plating processing device Plating processing device

2004-04-30

2008-08-26

King, Roy (Department: 1793)

Chemistry: electrical and wave energy

Apparatus

Electrolytic

C204S22400M, C204S234000, C204S237000, C134S151000, C134S175000

Reexamination Certificate

active

07416647

ABSTRACT:
A plating processing device comprises: a plating bath, on which an object to be plated is mounted; and a sparger provided with plating nozzle and washing nozzle for jetting plating solution and washing solution, respectively, toward the object in such a manner that the used plating solution and washing solution are accumulated and collected in the plating bath. Plating solution is supplied to the plating nozzle from a plating solution tank. Washing solution is supplied to the washing nozzle from a washing solution tank. The used plating solution and washing solution are accumulated in the plating bath, are recovered to the plating solution tank and used again as a plating solution.

REFERENCES:
patent: 4545885 (1985-10-01), Hori et al.
patent: 6858084 (2005-02-01), Inoue et al.
patent: 03-044479 (1991-02-01), None
patent: 11-092949 (1999-04-01), None
patent: 2001-316878 (2001-11-01), None

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