Plating current automatic compensating apparatus

Details Plating current automatic compensating apparatus Plating current automatic compensating apparatus

1987-01-20

1988-08-23

Valentine, Donald R.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204228, C25D 1700, C25D 2112

Patent

active

047658789

ABSTRACT:
An apparatus for automatically maintaining plating current density within a predetermined range while controlling plating current to produce a desired plating thickness includes means for energizing only the number of plating cells required to maintain plating current density within the predetermined range. The total plating current required to produce the desired plating thickness is distributed among the energized plating cells. Decreases in the number of energized plating cells is made at speed values which are less by a hysteresis value than speeds at which the number of energized plating cells is increased to avoid instability due to normal speed reading variations.

REFERENCES:
patent: 2744230 (1956-05-01), Few et al.
patent: 3061534 (1962-10-01), Jasperson
patent: 3887452 (1975-06-01), Mannaka et al.
patent: 4240881 (1980-12-01), Stanya
patent: 4497695 (1985-02-01), Shinkai et al.

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