Plating apparatus, cartridge and copper dissolution tank for...

Chemistry: electrical and wave energy – Apparatus – Electrolytic

Reexamination Certificate

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Details

C204S237000

Reexamination Certificate

active

10620728

ABSTRACT:
A plating apparatus provided with: three copper dissolution tanks connected to a plating liquid circulation path for supplying copper ions to a plating liquid; a buffer container for supplying a replacement liquid into some of the copper dissolution tanks not in use; and an undiluted replacement liquid supplying section for supplying an undiluted replacement liquid as a source of the replacement liquid into the buffer container. Copper mesh members each prepared by weaving a copper wire, straight copper pipes or copper plates are accommodated as a copper source in each of the copper dissolution tanks. The copper dissolution tanks each include a detachable cartridge, in which the copper mesh members or the like are disposed.

REFERENCES:
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patent: 4796782 (1989-01-01), Wales et al.
patent: 5100517 (1992-03-01), Starinshak et al.
patent: 5336406 (1994-08-01), Stanford et al.
patent: 5352350 (1994-10-01), Andricacos et al.
patent: 5976341 (1999-11-01), Schumacher et al.
patent: 5997712 (1999-12-01), Ting et al.
patent: 6258220 (2001-07-01), Dordi et al.
patent: 6527934 (2003-03-01), Steward
patent: 6958113 (2005-10-01), Mizohata et al.
patent: 4-74898 (1992-03-01), None
patent: 5-214598 (1993-08-01), None
patent: 2000-160400 (2000-06-01), None
patent: 2001-520315 (2001-10-01), None
patent: 2002-45802 (2002-02-01), None
patent: 2002-206199 (2002-09-01), None

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