Plating apparatus and plating method

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Agitating or moving electrolyte during coating

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C204S237000, C204S212000

Reexamination Certificate

active

07811440

ABSTRACT:
A plating apparatus performs a plating process while placing a work in a pod disposed in a plating bath storing a plating solution. The pod has a pair of meshes that allow the plating solution to pass but substantially inhibit the work from passing. The plating apparatus is provided with a solution flowing mechanism for flowing the plating solution out of the pod through one of the pair of meshes.

REFERENCES:
patent: 5851368 (1998-12-01), Rumph
patent: 6228230 (2001-05-01), Li et al.
patent: 2001/0045360 (2001-11-01), Omasa
patent: 1 203 645 (1970-08-01), None
patent: A-53-150816 (1978-11-01), None
patent: A-05-320993 (1993-12-01), None
patent: A 09-137295 (1997-05-01), None
English translation of Japanese Office Action issued in Application No. P2006-091457; mailed Oct. 20, 2009.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Plating apparatus and plating method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plating apparatus and plating method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plating apparatus and plating method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4232252

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.