Plating apparatus and plating method

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Contacting coating as it forms with solid member or material...

Reexamination Certificate

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C205S137000

Reexamination Certificate

active

07553400

ABSTRACT:
A plating method is capable of mechanically and electrochemically preferentially depositing a plated film in fine interconnect recesses such as trenches and via holes, and depositing the plated film to a flatter surface. The plating method including: disposing a substrate having fine interconnect recesses such that a conductive layer faces an anode; disposing a porous member between the substrate and the anode; filling a plating solution between the substrate and the anode; and repeating a process of holding the conductive layer and the porous member in contact with each other and moving the conductive layer and the porous member relatively to each other, a process of passing an electric current between the conductive layer and the anode while keeping the conductive layer still with respect to the porous member, and a process of stopping the supply of the electric current between the conductive layer and the anode.

REFERENCES:
patent: 6176992 (2001-01-01), Talieh
patent: 6261433 (2001-07-01), Landau
patent: 6402925 (2002-06-01), Talieh
patent: 6632335 (2003-10-01), Matsuda et al.
patent: 6689257 (2004-02-01), Mishima et al.
patent: 6793796 (2004-09-01), Reid et al.
patent: 6858123 (2005-02-01), Hu et al.
patent: 6913681 (2005-07-01), Matsuda et al.
patent: 2002/0020627 (2002-02-01), Kunisawa et al.
patent: 2003/0019755 (2003-01-01), Hey et al.

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