Plating apparatus

Details Plating apparatus Plating apparatus

2007-11-20

2007-11-20

Lamb, Brenda (Department: 1734)

Coating apparatus

With treatment of coating material

Of recirculated coating material

C118S429000

Reexamination Certificate

active

10481448

ABSTRACT:
There is provided a plating apparatus which can keep a plating solution always in its optimal condition while minimizing the amount of plating solution used, and which can easily form a uniform plated film on the plating surface of a workpiece.The plating apparatus includes: a plating solution supply system (70) for constantly circulating a plating solution while heating the plating solution in a circulation tank (80) provided with a heating apparatus (78a), and supplying a predetermined amount of plating solution to a plating treatment section (24) when carrying out plating treatment; a plating solution recovery system (72) for recovering the plating solution after the plating treatment in the plating treatment section (24), heating the plating solution and returning the heated plating solution to the circulation tank (80); and a plating solution replenishment system (74) for replenishing the circulation tank (80) with a fresh plating solution or a plating solution component.

REFERENCES:
patent: 2658839 (1953-11-01), Talmey et al.
patent: 2819188 (1958-01-01), Metheny et al.
patent: 2941902 (1960-06-01), Talmey et al.
patent: 2963002 (1960-12-01), Glaus
patent: 3067060 (1962-12-01), Glaus
patent: 3451374 (1969-06-01), Jarvi et al.
patent: 3620189 (1971-11-01), Hood et al.
patent: 3900599 (1975-08-01), Feldstein
patent: 6027567 (2000-02-01), Suzuki
patent: 0890658 (1999-01-01), None
patent: 63-83282 (1988-04-01), None
patent: 11-12746 (1999-01-01), None

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