Platen coating structure for chemical mechanical polishing and m

Details Platen coating structure for chemical mechanical polishing and m Platen coating structure for chemical mechanical polishing and m

1996-12-02

1998-04-28

Rose, Robert A.

Abrading

Abrading process

Glass or stone abrading

451548, B24C 722

Patent

active

057437882

ABSTRACT:
A structure for protecting chemical mechanical polishing (CMP) apparatus components from corrosion includes a refractory metal oxide coating layer (33) formed over surfaces of a platen (32). In a preferred embodiment, the refractory metal oxide coating layer (33) is a plasma-flame sprayed chromium-oxide layer. In an alternative embodiment, a sealer layer (42) is placed at least within pores (41) of refractory metal oxide coating layer (33) for additional protection. The refractory metal oxide coating layer (33) is also suitable for protecting other CMP apparatus components that are susceptible to corrosion.

REFERENCES:
patent: 5183402 (1993-02-01), Cooke et al.
patent: 5558717 (1996-09-01), Zhao et al.
patent: 5584146 (1996-12-01), Shamouillan et al.
Metco Perkin Elmer, Handbook of Coating Recommendations, "Oxide Ceramic Coating", 1988, pp. 1-7.

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