Platen and beam setup flag assembly for ion implanter

Details Platen and beam setup flag assembly for ion implanter Platen and beam setup flag assembly for ion implanter

1987-05-04

1988-01-05

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504421, H01J 3700

Patent

active

047178299

ABSTRACT:
A platen and beam setup assembly for use in an ion implanter includes a platen for wafer mounting and a beam setup flag for beam measurement. The platen and the setup flag are angularly displaced with respect to a common mounting shaft perpendicular to the ion beam. The assembly can be rotated about the shaft between a first position wherein the wafer is exposed to the ion beam and a second position wherein the setup flag is exposed to the ion beam. In a preferred embodiment, the platen is positioned for wafer exchange when the setup flag is exposed to the ion beam.

REFERENCES:
patent: 3885157 (1975-05-01), Heimemann
patent: 3901183 (1975-08-01), Wittkower
patent: 3954191 (1976-05-01), Wittkower et al.
patent: 4011449 (1977-03-01), Ko et al.
patent: 4013891 (1977-03-01), Ko et al.
patent: 4234797 (1980-11-01), Ryding
patent: 4282924 (1981-08-01), Faretra
patent: 4361762 (1982-11-01), Douglas
patent: 4595837 (1986-06-01), Wu et al.
"DF-3000 Ion Implantation System", Varian, Extrion Division, Brochure, May 1982.

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