Plated aluminum alloy, cylinder block thereof, plating line and

Details Plated aluminum alloy, cylinder block thereof, plating line and Plated aluminum alloy, cylinder block thereof, plating line and

1997-10-29

1999-11-09

Valentine, Donald R.

Electrolysis: processes, compositions used therein, and methods

Electrolytic coating

Treating substrate prior to coating

205640, C25D 534

Patent

active

059807229

ABSTRACT:
A method of plating an aluminum alloy, of which the steps are small in number and the productivity is improved as compared with conventional zincate conversion or anodic oxidation methods and which attains a decrease in cost and obviates the use of mixed acids, and a plated aluminum alloy of which the coating has excellent adhesion, the method comprising the steps of carrying out anodic etching of a silicon-containing aluminum alloy to protrude silicon from the surface of the aluminum alloy, optionally carrying out anodic oxidation of the aluminum alloy on its surface from which the silicon is protruded, and plating the aluminum alloy, and the plated aluminum alloy containing silicon in a state where the silicon bridges the aluminum alloy and the plating layer.

REFERENCES:
patent: 4225399 (1980-09-01), Tomita
patent: 4566952 (1986-01-01), Sprintschnik et al.
patent: 4584067 (1986-04-01), Hutchins et al.
patent: 4608131 (1986-08-01), Brenk
patent: 5643434 (1997-07-01), Benmalek et al.
patent: 5647967 (1997-07-01), Murase et al.
patent: 5660704 (1997-08-01), Murase
patent: 5775892 (1998-07-01), Miyasaka et al.

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