Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Including heat exchanger for reaction chamber or reactants...
Reexamination Certificate
2007-07-30
2010-11-16
Griffin, Walter D (Department: 1797)
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Including heat exchanger for reaction chamber or reactants...
C422S168000, C422S173000, C422S175000, C422S176000, C422S177000, C422S180000, C422S211000, C422S219000, C422S220000
Reexamination Certificate
active
07833496
ABSTRACT:
The present invention provides a plate-shaped preferential oxidation (PROX) reactor. The plate-shaped PROX reactor of the present invention includes a plate-shaped chamber having an inlet to supply gas and an outlet to discharge fluid, a distributor for distributing gas supplied into the inlet, a main reactor having a catalyst for converting carbon monoxide contained in the gas into another material, and a radiator disposed on an outer surface of the chamber to dissipate heat.
REFERENCES:
patent: 2574142 (1951-11-01), Buongirno
patent: 7261866 (2007-08-01), Kadowaki et al.
patent: 2002/0131915 (2002-09-01), Shore et al.
patent: 2004/0038093 (2004-02-01), Echigo et al.
patent: 2004/0065013 (2004-04-01), DeVries
patent: 2005/0042151 (2005-02-01), Alward et al.
patent: 2006/0022065 (2006-02-01), Hagan et al.
patent: 2006/0067863 (2006-03-01), Wheat et al.
patent: 09-030801 (1997-02-01), None
patent: 2002-025597 (2002-01-01), None
patent: 2002-193602 (2002-07-01), None
patent: 2004-182494 (2004-07-01), None
patent: 2004-193013 (2004-07-01), None
patent: 10-2006-0065780 (2006-06-01), None
patent: 10-2006-0081729 (2006-07-01), None
patent: 10-2006-0096700 (2006-09-01), None
Notice of Allowancefrom the KIPO issued in Applicant's corresponding Korean Patent Application No. 10-2007-0002531 dated Apr. 3, 2008.
Bushnell , Esq. Robert E.
Griffin Walter D
Samsung SDI & Co., Ltd.
Seifu Lessanework
LandOfFree
Plate type preferential oxidation reactor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plate type preferential oxidation reactor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plate type preferential oxidation reactor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4151286