Plasma X-ray source

Details Plasma X-ray source Plasma X-ray source

1985-09-05

1986-12-02

Church, Craig E.

X-ray or gamma ray systems or devices

Source

378 34, G21B 100, H01J 3500

Patent

active

046270868

ABSTRACT:
A plasma X-ray source is operable, like the plasma focus type source, to generate impulse discharge through a gas filled in a discharge tube. A relatively small amount of the gas is continuously supplied to and evacuated from the discharge tube in accordance with an occurrence frequency of discharge, without operating evacuation and filling of the gas at each cycle of discharge, under the regulation to make constant the pressure within the discharge tube, thereby eliminating the time for exchange of gas contaminated by discharge, reducing the amount of gas used, and improving reproducibility of discharge.

REFERENCES:
patent: 3746860 (1973-07-01), Shatas et al.
patent: 4152625 (1979-05-01), Conrad
patent: 4355262 (1982-10-01), Chan et al.

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