X-ray or gamma ray systems or devices – Source
Patent
1987-02-10
1989-06-20
Howell, Janice A.
X-ray or gamma ray systems or devices
Source
378 34, 31511121, 31511171, H01J 3500
Patent
active
048415561
ABSTRACT:
A plasma X-ray source in which a discharge tube containing a pair of coaxial cylindrical electrodes is filled with a gas, a high voltage pulse from a charged capacitor is applied between the cylindrical electrodes to convert the gas into a plasma, the plasma is focused on a position near the end of the inner one of the cylindrical electrodes to generate X-rays, and the X-rays thus generated are emitted to the outside of the discharge tube through a window provided thereon, is disclosed. In the above X-ray source, the high voltage pulse is applied between the cylindrical electrodes so that the inner cylindrical electrode is at a negative potential with respect to the outer cylindrical electrode.
REFERENCES:
patent: 3946240 (1976-03-01), Roberts et al.
patent: 3959659 (1976-05-01), Roberts et al.
patent: 4301391 (1981-11-01), Seliger et al.
patent: 4538291 (1985-08-01), Iwamatsu
patent: 4596030 (1986-06-01), Herzinger et al.
patent: 4627086 (1986-12-01), Kato et al.
patent: 4635282 (1987-01-01), Okuda et al.
patent: 4644576 (1987-02-01), Kuyel
patent: 4648106 (1987-03-01), Novak
patent: 4663567 (1987-05-01), Wong
patent: 4715054 (1987-12-01), Kato et al.
"X-Ray Lithography Using a Pulsed Plasma Source", by Pearlman et al., J. Vac. Sci. Technol., 19 (4), Nov./Dec. 1981, pp. 1190-1193.
Kato Yasuo
Murayama Seiichi
Ochiai Isao
Watanabe Yoshio
Freeman John C.
Hitachi , Ltd.
Howell Janice A.
LandOfFree
Plasma X-ray source does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma X-ray source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma X-ray source will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-531207