Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Reexamination Certificate
2005-04-12
2005-04-12
Padgett, Marianne (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
C427S488000, C427S489000, C427S491000, C427S536000, C427S538000, C427S539000, C427S569000, C427S577000, C427S579000
Reexamination Certificate
active
06878419
ABSTRACT:
The application discloses methods of plasma treatment that employ an ion sheath in a capacitively-coupled system to increase the hydrophilicity of porous articles, including microporous articles having pore sizes of 0.05 to 1.5 micrometers, both on their surfaces and in their pores such that the articles' bulk wetting properties are improved.
REFERENCES:
patent: 3632494 (1972-01-01), Herte et al.
patent: 4438154 (1984-03-01), Kato et al.
patent: 4643876 (1987-02-01), Jacobs et al.
patent: 4749588 (1988-06-01), Fukuda et al.
patent: 4760005 (1988-07-01), Pai
patent: 4806246 (1989-02-01), Nomura
patent: 4840636 (1989-06-01), Bauser et al.
patent: 4869922 (1989-09-01), D'Angostino et al.
patent: 4946903 (1990-08-01), Gardella et al.
patent: 4968918 (1990-11-01), Kondo et al.
patent: 4980196 (1990-12-01), Yasuda et al.
patent: 5034265 (1991-07-01), Hoffman et al.
patent: 5102738 (1992-04-01), Bell et al.
patent: 5224441 (1993-07-01), Felts et al.
patent: 5234529 (1993-08-01), Johnson
patent: 5260345 (1993-11-01), DesMarais et al.
patent: 5364665 (1994-11-01), Felts et al.
patent: 5368668 (1994-11-01), Tochacek et al.
patent: 5462781 (1995-10-01), Zukowski
patent: 5486357 (1996-01-01), Narayanan
patent: 5494523 (1996-02-01), Steger et al.
patent: 5494744 (1996-02-01), Everhart et al.
patent: 5679264 (1997-10-01), Gsell
patent: 5783641 (1998-07-01), Koh et al.
patent: 5871811 (1999-02-01), Wang et al.
patent: 5888594 (1999-03-01), David et al.
patent: 5948166 (1999-09-01), David et al.
patent: 5980814 (1999-11-01), Roller et al.
patent: 6015597 (2000-01-01), David
patent: 6046758 (2000-04-01), Brown et al.
patent: 6074534 (2000-06-01), Goudmand et al.
patent: 6243112 (2001-06-01), Kuhman et al.
patent: 6468642 (2002-10-01), Bray et al.
patent: 41 22 834 (1993-01-01), None
patent: 0 448 227 (1991-09-01), None
patent: 0 710 739 (1996-05-01), None
patent: 0 805 476 (1997-11-01), None
patent: 0 985 741 (2000-03-01), None
patent: 6-184533 (1994-07-01), None
patent: 6-299146 (1994-10-01), None
patent: 2000-117880 (2000-04-01), None
patent: 2000-239963 (2000-09-01), None
patent: WO 9627044 (1996-09-01), None
patent: WO 9746484 (1997-12-01), None
patent: WO 9905358 (1999-02-01), None
patent: WO 9922635 (1999-05-01), None
patent: WO 9928530 (1999-06-01), None
patent: WO 0016913 (2000-03-01), None
patent: WO 0016914 (2000-03-01), None
patent: WO 0107144 (2001-02-01), None
patent: WO 0166820 (2001-09-01), None
Database WPI, Section Ch, Week 199210, Derwent Publications Ltd., London, GB; XP002238263 & JP 04 018922 A, Jan. 23, 1992, Abstract, to (n10d) nok corp.
Article: Tran et al., “Plasma Modification and Collagen Binding to PTFE Grafts,” Journal of Colloid and Interface Science, vol. 132, Oct. 15, 1989, pp. 373-381.
Article: Yeh et al., “Blood Compatibility of Surfaces Modified by Plasma Polymerization,” Journal of Biomedical Materials Research, vol. 22, No. 9, Sep., 1988, pp. 795-818.
Article: Iriyama et al., “Plasma Surface Treatment on Nylon Fabrics by Fluorocarbon Compounds,” Journal of Applied Polymer Science, vol. 39, No. 2, Jan. 20, 1990, pp. 249-264.
Article: David et al., “Plasma Deposition and Etching of Diamond-Like Carbon Films,” AICHE Journal, vol. 37, No. 3, Mar., 1991, pp. 367-376.
David Moses Mekala
Lakshmi Brinda Balasubramaniam
3M Innovative Properties Co.
Edman Sean
Padgett Marianne
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