Plasma treatment for ceramic materials

Stock material or miscellaneous articles – Surface property or characteristic of web – sheet or block

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360102, 360103, 360104, 428408, 428694, 428695, 428696, C23C 1448, B32B 1800

Patent

active

051185776

ABSTRACT:
An etching and fluorinating treatment is disclosed for modifying the surface properties of magnetic data storage media and sliders for magnetic data transducing heads. Media enclosed within a plasma chamber is first exposed to an argon plasma for cleaning, then exposed to a plasma mixture including argon with either fluorine or carbon tetrafluoride, maintained at a pressure of approximately half of atmospheric pressure, at a temperature of about 100.degree. C. An electrical field is generated for forming argon, carbon and fluorine ions. The argon ions etch the carbon overcoat of the disc, while the carbon and fluorine ions combine with the carbon to form extended chain fluoropolymers, and also penetrate the carbon layer. Sliders are treated in a plasma mixture of argon and CF.sub.4. During such treatment, carbon and fluorine ions penetrate exposed surface areas of the slider, and form a reaction product of solid lubricant film. In connection with both processes, ion penetration and reaction product formation reduce surface energy and strengthen cohesive bonding. The formation of a solid lubricant of extended chain fluoropolymers improves lubricity.

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