Plasma treatment apparatus

Details Plasma treatment apparatus Plasma treatment apparatus

1986-07-03

1988-08-30

Lacey, David L.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

156345, 156643, 118715, 118723, 118729, 118 501, 31511121, 204298, C23C 1400, C23C 1600

Patent

active

047676418

ABSTRACT:
Device for the plasma treatment of substrates (7) in a high frequency-excited plasma discharge between two electrodes (3, 8), supplied by a high-frequency source (6). The first electrode is constructed as a hollow anode (3) and the second electrode (8), which carries the substrate (7), is deposited in front of the hollow space (10) of the hollow anode or can be passed by this. Moreover, the hollow anode (3) has an edge (9), which is drawn out in the direction of the second electrode (8) and which, relative to the second electrode, forms a gap s.sub.1 all around that does not exceed 10 mm in width. In order to form the electrode so that the gap width is not a critical feature, projections (12) are disposed in the hollow space (10) of the hollow anode (3), said projections increasing the internal surface area (11) of the hollow anode (3). Preferably, these projections (12) are constructed as rib structures, which may also assume a honeycomb form.

REFERENCES:
patent: 4209357 (1980-06-01), Gorin et al.
patent: 4351714 (1982-09-01), Kuriyama
patent: 4612432 (1986-09-01), Sharp-Geisler
patent: 4633809 (1987-01-01), Hirose et al.
patent: 4637853 (1987-01-01), Bumble et al.

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