Plasma treatment apparatus

Details Plasma treatment apparatus Plasma treatment apparatus

2006-12-07

2010-10-05

Zervigon, Rudy (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C118S7230AN, C156S345330, C156S345480

Reexamination Certificate

active

07806078

ABSTRACT:
A plasma CVD apparatus has a container, and channels composed of introduction grooves and circumferential grooves for different types of gases are formed within the container. The gases introduced through source gas piping, auxiliary gas piping, and cleaning gas piping are equally supplied to a plurality of supply nozzles, a plurality of auxiliary gas supply nozzles, and a plurality of cleaning gas nozzles. The configuration of the container can be simplified without complicating pipings for the gases.

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