Plasma treating apparatus and plasma treating method

Details Plasma treating apparatus and plasma treating method Plasma treating apparatus and plasma treating method

1996-05-07

1997-11-25

Niebling, John

Coating apparatus

Gas or vapor deposition

With treating means

118723IR, 118724, C23C 1600

Patent

active

056900503

ABSTRACT:
The present invention is directed to a plasma treating apparatus, for generating plasma in a dielectric container and for treating the surface of a substrate with the plasma generated, which includes a hot air heating system for heating the dielectric container by blowing hot air to a central location on the outside surface of the dielectric container.
The present invention is further directed to a plasma treating method for generating plasma in a dielectric container and for treating the surface of a substrate with the plasma generated which includes hot air heating for heating the dielectric container by blowing hot air to the outside surface of the dielectric container to a temperature at which a thin film does not deposit on the inside surface of the dielectric container.

REFERENCES:
patent: 3886896 (1975-06-01), Van Cakenberghe
patent: 4990229 (1991-02-01), Campbell et al.
patent: 5364488 (1994-11-01), Minato et al.

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