Electric lamp and discharge devices: systems – Combined load device or load device temperature modifying... – Distributed parameter resonator-type magnetron
Patent
1981-10-28
1984-03-20
Chatmon, Jr., Saxfield
Electric lamp and discharge devices: systems
Combined load device or load device temperature modifying...
Distributed parameter resonator-type magnetron
219121PL, 427 34, 31323101, 31511161, 31511141, H01J 746, H01J 1980
Patent
active
044383681
ABSTRACT:
A plasma treating apparatus includes: an air-core coil for generating a static magnetic field which is axially uniform and a high-frequency waveguide for generating a high-frequency electromagnetic field which is irregular in the axial direction of the air-core coil. A plasma generating glass tube is disposed in the high-frequency waveguide and adapted to be supplied with a gas and a plasma reaction bath held under a vacuum for receiving the plasma flow which is generated axially in the glass tube. A substrate platform is disposed in the reaction bath for supporting a substrate to be treated at a right angle with respect to the plasma flow. There is also included a magnetic field generating coil disposed outside of said reaction bath for shaping the plasma.
REFERENCES:
patent: 2817045 (1957-12-01), Goldstein et al.
patent: 2837693 (1958-06-01), Norton
patent: 3280364 (1966-10-01), Sugawara et al.
patent: 3313979 (1967-04-01), Landauer
patent: 3541372 (1970-11-01), Omura et al.
patent: 3872349 (1975-03-01), Spero et al.
patent: 3906892 (1975-09-01), Van Cakenberghe
patent: 3911318 (1975-10-01), Spero et al.
Abe Haruhiko
Denda Masahiko
Harada Hiroshi
Kono Yoshio
Nagasawa Koichi
Chatmon, Jr. Saxfield
Mitsubishi Denki & Kabushiki Kaisha
LandOfFree
Plasma treating apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma treating apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma treating apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1606580