Plasma treating apparatus

Electric lamp and discharge devices: systems – Combined load device or load device temperature modifying... – Distributed parameter resonator-type magnetron

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219121PL, 427 34, 31323101, 31511161, 31511141, H01J 746, H01J 1980

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active

044383681

ABSTRACT:
A plasma treating apparatus includes: an air-core coil for generating a static magnetic field which is axially uniform and a high-frequency waveguide for generating a high-frequency electromagnetic field which is irregular in the axial direction of the air-core coil. A plasma generating glass tube is disposed in the high-frequency waveguide and adapted to be supplied with a gas and a plasma reaction bath held under a vacuum for receiving the plasma flow which is generated axially in the glass tube. A substrate platform is disposed in the reaction bath for supporting a substrate to be treated at a right angle with respect to the plasma flow. There is also included a magnetic field generating coil disposed outside of said reaction bath for shaping the plasma.

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patent: 3541372 (1970-11-01), Omura et al.
patent: 3872349 (1975-03-01), Spero et al.
patent: 3906892 (1975-09-01), Van Cakenberghe
patent: 3911318 (1975-10-01), Spero et al.

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