Plasma system for enhancing the surface of a material

Details Plasma system for enhancing the surface of a material Plasma system for enhancing the surface of a material

1996-06-04

1999-05-04

Geist, Gary

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156345MG, 20429837, C23F 102, C23C 1400

Patent

active

059001046

ABSTRACT:
A housing is provided which is positionable adjacent a surface of a material to be treated. The housing and the surface of the material cooperate to form a reaction chamber. An exposure environment is provided having a plurality of components within the reaction chamber. A first component comprises charged particles. A second component comprises chemically active neutral particles. A third component comprises electromagnetic radiation. When the housing is so positioned adjacent a surface and the desired exposure environment is provided, the surface is altered as desired for cleaning, material removal or as preparation for adhesive bonding or etching.

REFERENCES:
patent: 3462335 (1969-08-01), Hansen et al.
patent: 4588641 (1986-05-01), Haque et al.
patent: 4765860 (1988-08-01), Ueno et al.
patent: 5236512 (1993-08-01), Rogers et al.
patent: 5290382 (1994-03-01), Zarowin et al.

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