Coating apparatus – Gas or vapor deposition – With treating means
Patent
1992-07-07
1994-04-19
Hearn, Brian E.
Coating apparatus
Gas or vapor deposition
With treating means
118722, 118723E, 118715, 156345, C23C 1650
Patent
active
053042506
ABSTRACT:
A plasma system which eliminates damage derived from charged particles in the plasma and which is able to perform uniform plasma CVD and plasma etching on a large area substrate, wherein a mesh plate having a plurality of holes is placed at the interface of a plasma generation chamber and a substrate treatment chamber which holds a substrate, a high frequency electrical field being applied between an upper electrode in the plasma generation chamber and the mesh plate so as to disassociate the plasma forming gas by electrodischarge so as to cause the generation of plasma. By this, the plasma is isolated from the substrate. On the other hand, source gas supply ports are opened near the holes of the mesh plate, the source gas being introduced from there being brought into contact with the plasma through the holes, whereby the reaction product can be uniformly produced in a broad area. If the reaction product is a deposit-like substance, plasma CVD becomes possible, while if of the etching type, plasma etching becomes possible.
REFERENCES:
patent: 4243506 (1981-01-01), Ikeda et al.
patent: 4262631 (1981-04-01), Kubacki
patent: 4401054 (1983-08-01), Matsuo et al.
patent: 4624214 (1986-11-01), Suzuki et al.
patent: 4691662 (1987-09-01), Roppel et al.
patent: 4971653 (1990-11-01), Powell et al.
patent: 5015331 (1991-05-01), Powell
patent: 5018479 (1991-05-01), Markunas et al.
patent: 5105761 (1992-04-01), Charlet et al.
Hara Masaki
Sameshima Toshiyuki
Sano Naoki
Usui Setsuo
Baskin Jonathan D.
Hearn Brian E.
Kananen Ronald P.
Sony Corporation
LandOfFree
Plasma system comprising hollow mesh plate electrode does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma system comprising hollow mesh plate electrode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma system comprising hollow mesh plate electrode will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-17529