Electric lamp and discharge devices – With gas or vapor – Three or more electrode discharge device
Reexamination Certificate
2001-11-29
2004-08-24
Glick, Edward J. (Department: 2882)
Electric lamp and discharge devices
With gas or vapor
Three or more electrode discharge device
C313S498000, C313S582000, C313S499000
Reexamination Certificate
active
06781309
ABSTRACT:
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to an organic electroluminescent display, and more particularly, to a plasma switched organic electroluminescent display driven by plasma switches.
2. Background of the Related Art
As information telecommunication technologies have been greatly developed, a variety of demands for electronic display devices are highly increased to keep up with the developing information society. And, so do the demands for various displays. In order to satisfy the demands of the information society, for electronic display devices are required characteristics such as high-resolution, large-size, low-cost, high-performance, slim-dimension, and small-size and the like, for which new flat panel displays(FPD) are developed as substitutions for the conventional cathode ray tube(CRT).
The FPDs include LCD(liquid crystal display), ELD(electroluminescent display), PDP(plasma display panel), FED(field emission display), VFD(vacuum fluorescence display), and LED(light emitting display), and the like.
Compared to the non-emissive device such as LCD, ELD attracts attention as FPD having a response speed faster than that of the non-emissive display, excellent brightness by self-luminescence, easy fabrication thanks to a simple structure, and light weight/slim design. Thus, ELD is widely applied to various fields such as LCD backlight, mobile terminal, car navigation system(CNS), notebook computer, wall TV, and the like.
Such an ELD is divided into two categories, i.e. organic electroluminescent display (hereinafter abbreviated OELD) and inorganic electroluminescent display (hereinafter abbreviated IELD) in accordance with materials used for luminescent layers respectively.
IELD, which emits light using the collisions of electrons accelerated by an high electric field, is classified into AC thin film ELD, AC thick film ELD, DC thin film ELD, and the like in accordance with thickness of the thin films and driving systems.
And, OELD, which emits light by a current flow, is classified into low-molecular OELD and high-molecular OELD.
FIG. 1
illustrates a cross-sectional view of a basic construction of OELD using a high molecular electroluminescent material according to a related art.
Referring to
FIG. 1
, stacked on a transparent substrate
11
such as a glass substrate in order are a transparent anode layer
12
formed of ITO(indium tin oxide) or IZO(indium zinc oxide), a hole transport layer
13
, an electroluminescent layer
14
, and a cathode layer
15
formed of a metal.
A material for the electroluminescent layer
14
is a conductive high molecule as a kind of conjugated polymers disclosed on U.S. Pat. No. 5,399,502, and U.S. Pat. No. 5,807,627 such as poly(p-phenylenevinylene), i.e. PPV, poly(thiophene), poly(2,5-dialkoxyphenylene-vinylene, i.e. PDMeOPV or the like.
FIG. 2
illustrates a cross-sectional view of a basic construction of OELD using a low molecular electroluminescent material for fluorescence according to a related art.
Referring to
FIG. 2
, stacked on a transparent substrate
21
such as a glass substrate in order are a transparent anode layer
22
formed of ITO(indium tin oxide) or IZO(indium zinc oxide), a hole injection layer
23
, a hole transport layer
24
, an electroluminescent layer
25
, an electron transport layer
26
, and a cathode layer
27
formed of metal. The hole injection layer
23
, hole transport layer
24
, and electron transport layer
26
play an auxiliary role in increasing a luminescent efficiency of OELD. In this case, the electroluminescent layer
25
is formed of aluminum tris(8-hydroxyquinoline), i.e. Alq3, perylene, or the like, which are disclosed on U.S. Pat. No. 4,769,292 and U.S. Pat. No. 5,294,870.
FIG. 3
illustrates a cross-sectional view of a basic construction of OELD using a low molecular electroluminescent material for phosphorescence according to a related art.
Referring to
FIG. 3
, stacked on a transparent substrate
31
such as a glass substrate in order are a transparent anode layer
32
formed of ITO(indium tin oxide) or IZO(indium zinc oxide), a hole injection layer
33
, a hole transport layer
34
, an electroluminescent layer
35
, a hole blocking layer
36
, an electron transport layer
37
, and a cathode layer
38
formed of metal.
The hole injection layer
33
, hole transport layer
34
, hole blocking layer
36
, and electron transport layer
37
play an auxiliary role in increasing a luminescent efficiency of OELD. In this case, the electroluminescent layer
35
is formed of one of phosphorescent emitting materials disclosed on U.S. Pat. No. 6,090,149 such as platinum 2,3,7,8,12,12,17,18-octaethyl-21H,23H-porphine, i.e. PtOEP, iridium complex of Ir(PPY)3, and the like. And, the hole blocking layer
36
is formed of bathocuproine, i.e. BCP, cabazole biphenyl, i.e. CBP, N,N′-diphenyl-N,N′-bis-alpha-napthylbenzidine, i.e. NPD.
OELD is divided into active and passive types in accordance with the driving systems. The passive type OELD is driven by a current driving system so that an efficiency of power consumption and a device reliability are decreased as a panel size increases. To settle such problems in case that a diagonal diameter of a panel is longer than 10 inches, the active type OELD using polysilicon thin film transistors(poly-Si TFT) as driving devices is widely used.
Yet, when the polysilicon TFT is used as the driving device, the current technology fails to secure a uniformity of the polysilicon TFT, and a device reliability to drive OELD. And, the current technology also requires at least two TFTs for driving the OELD, thereby failing to secure a sufficient yield as well as realize a large-sized screen. And, the current technology also needs a complicated fabricating process, a high-vacuum process requiring an ultra vacuum environment and an expensive equipment for fine photolithography, and a high cleanness less than class 100, whereby a high cost of production is inevitable.
Meanwhile, at the stage of commercial use is a plasma display panel (hereinafter abbreviated PDP) using a memory function of plasma. Specifically, PDP is more suitable for a wide screen exceeding a size over 42 inches than OELD or Poly-Si TFT display.
FIG. 4
illustrates a schematic bird's-eye view of disassembled upper and lower plates of PDP for pixel areas according to a related art, in which shown is an example of a general AC type 3-electrodes surface discharge PDP disclosed on U.S. Pat. No. 5,420,602, U.S. Pat. No. 5,661,500, and U.S. Pat. No. 5,674,553. And, the pixel areas of the 3-electrodes surface discharge PDP are shown in the drawing.
And,
FIG. 5
schematically illustrates cross-sectional views of the assembled upper and lower plates of PDP shown in
FIG. 4
along bisecting lines A-A′ and B-B′, respectively, in which the cross-sectional views of the upper and lower plates are combined each other in case that the upper plate is rotated clockwise at 90° for the convenience of understanding.
Referring to FIG.
4
and
FIG. 5
, the pixel areas are provided by a front substrate
41
like a transparent plate such as a glass on an image display surface and a rear substrate
42
placed in parallel with the front substrate
41
.
On the front substrate
41
formed are a plurality of transparent sustain electrodes
47
constructing pairs of electrodes X and Y on a surface confronting the rear substrate
42
with uniform intervals therebetween, a plurality of auxiliary sustain electrodes
48
formed on the sustain electrodes
47
respectively so as to reduce resistances of the sustain electrodes
26
respectively, a transparent dielectric layer
49
controlling a discharge current formed on a display (active) area including the auxiliary sustain and sustain electrodes
47
and
48
, and a protecting layer
50
on the transparent dielectric layer
49
so as to protect the transparent dielectric layer
49
from plasma etch using of a material such as MgO or the like having a high secondary electron discharge coefficient to help to generate plasm
Byun Byung-hyun
Choi Do-hyun
Yi Seung-jun
CLD, Inc.
Gemmell Elizabeth
Glick Edward J.
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