Plasma surface treating method and apparatus

Details Plasma surface treating method and apparatus Plasma surface treating method and apparatus

1992-12-16

1993-12-07

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156655, 156668, 134 1, B44C 122, B29C 3700

Patent

active

052680568

ABSTRACT:
In a plasma surface treating method, a sample to be treated is supported on a first electrode within a vacuum vessel and a second electrode is caused to confront the first electrode. Active species of negative ions are then generated by means of a direct current glow discharge produced in an abnormal glow discharge region and are subsequently impinged upon a surface of the sample to induce a chemical reaction with the sample.

REFERENCES:
patent: 4307283 (1981-12-01), Zajac
patent: 4352725 (1982-10-01), Tsukada
patent: 5110405 (1992-05-01), Sawabe et al.

Affiliated with

Also associated with

Rating

Plasma surface treating method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma surface treating method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma surface treating method and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2013672