Plasma sterilizing process with pulsed antimicrobial agent pretr

Chemical apparatus and process disinfecting – deodorizing – preser – Process disinfecting – preserving – deodorizing – or sterilizing – Using direct contact with electrical or electromagnetic...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

422 23, 422 28, 422906, 422907, 25045511, A61L 214, A61L 220

Patent

active

052446298

ABSTRACT:
A process for plasma sterilization including exposing an article in a sterilizing chamber to at least one combination sterilizing cycle. Each combination sterilizing cycle includes a pulsed treatment with gaseous antimicrobial agent, removal of the gaseous antimicrobial agent, and a plasma treatment. The pulsed treatment includes one or more pulse-vacuum cycles, each pulse-vacuum cycle includes the steps of evacuating the sterilizing chamber and exposing the article to the gaseous antimicrobial agent with a predetermined pressure profile during a predetermined time. The gaseous antimicrobial agent is preferably carried in a gas mixture with a nonreactive carrier gas. In one embodiment, the predetermined pressure is pulsed. In another embodiment, it is ramped. After the pulsed treatment, the antimicrobial agent is removed by evacuating the sterilizing chamber. The plasma treatment includes exposing the article to a plasma having essentially uncharged, highly reactive free radicals and atoms.

REFERENCES:
patent: 3383163 (1968-05-01), Menashi
patent: 3410776 (1968-11-01), Bersin
patent: 3428548 (1969-02-01), Hollahan
patent: 3704096 (1972-11-01), Verses et al.
patent: 3737608 (1973-06-01), Nago et al.
patent: 3851436 (1974-12-01), Fraser et al.
patent: 3948601 (1976-04-01), Fraser et al.
patent: 4065369 (1977-12-01), Ogawa et al.
patent: 4123663 (1978-10-01), Horiike
patent: 4138306 (1979-02-01), Niwa
patent: 4151034 (1979-04-01), Yamamoto
patent: 4160690 (1979-07-01), Shibagaki
patent: 4169123 (1979-09-01), Moore et al.
patent: 4169124 (1979-09-01), Forstrom et al.
patent: 4207286 (1980-06-01), Boucher
patent: 4230663 (1980-10-01), Forstrom et al.
patent: 4289728 (1981-09-01), Peel et al.
patent: 4321232 (1982-03-01), Bithell
patent: 4348357 (1982-09-01), Bithell
patent: 4366125 (1982-12-01), Kodera et al.
patent: 4437567 (1984-03-01), Jeng
patent: 4643876 (1987-02-01), Jacobs et al.
patent: 4756882 (1988-07-01), Jacob
patent: 4801427 (1989-01-01), Jacob
patent: 4818488 (1989-04-01), Jacob
patent: 4898715 (1990-02-01), Jacob
patent: 4917586 (1990-04-01), Jacob
patent: 4931261 (1990-06-01), Jacob
patent: 4943417 (1990-06-01), Jacob
patent: 4976920 (1990-12-01), Jacob
patent: 5115166 (1992-05-01), Campbell et al.
patent: 5178829 (1993-01-01), Moulton et al.
Hallohan et al., "Analytical Applications of Electrodelessly Discharged Gases" Chemical Instrumental, Journal of Chem. Education, 43:A401-A416.
Hallohan et al., "Research with Electrodelessly Discharged Gases," Chemical Instrument, 43:A497-A512.
Hallohan et al., "Chem. Education Letters," Journal of Chem. Education 43:392-393.
Hallohan et al., "Techniques and Applications of Plasma Chemistry," v-v11, 229-253.
Rudder et al., "Remote Plasma-Enhanced Chemical-Vapor Deposition of Epitaxial Ge Films," J. Appl. Phys., 60(1):3522.
Leaper et al., "Influence of Temperature on the Synergistic Sporicidal Effect of Peracetic Acid Plus Hydrogen Peroxide on Bacillus Subtilis" SA22 (NCA 72-52), Food Microbiology, 1:199-203, 1984.
Leaper et al., "A Note on the Effect of Storage on the Chemical Resistance of Spores of Bacillus Subtilis SA22 and Bacillus Subtilis Glogigii B17," J. Applied Biology 64:183-186, 1988.
Leaper et al., "Synergistic Killing of Spores of Bacillus Subtilis by Peracetic Acid and Alcohol," J. Food Technology, 19:355-360, 1984.
Leaper et al., "Comparison of the Resistance to Hydrogen Peroxide of Wet and Dry Spores of Bacillus Subtilis SA222," J. Food Technology, 19:695-702, 1984.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Plasma sterilizing process with pulsed antimicrobial agent pretr does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma sterilizing process with pulsed antimicrobial agent pretr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma sterilizing process with pulsed antimicrobial agent pretr will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2024595

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.