Plasma sputtering installation with microwave enhancement

Details Plasma sputtering installation with microwave enhancement Plasma sputtering installation with microwave enhancement

1994-07-08

1995-12-26

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429816, 20429838, C23C 1434, C23C 1435

Patent

active

054784590

ABSTRACT:
A microwave ring resonator surrounds a cathode target and feeds microwaves to a plasma volume over the target through a slit system in such a way that the waves do not pass through the cathode dark space.

REFERENCES:
patent: 4610770 (1986-09-01), Saito et al.
patent: 4721553 (1988-01-01), Saito et al.
patent: 5006219 (1991-04-01), Latz et al.
patent: 5230784 (1993-07-01), Yoshida
patent: 5296784 (1994-03-01), Geisler et al.
patent: 5397448 (1995-03-01), Gesche et al.
Yoshida, Property of a Microwave Magnetron Plasma Source Inside a Coaxial Line, J. Appl. Physics vol. 31 (1992) 1480-84.
Yoshida, Microwave Enhanced Magnetron Sputttering, Rev. Sci. Instr. 63(1) Jan. 1992 pp. 179-183.

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