Plasma source for generating inductively coupled, plate-shaped p

Details Plasma source for generating inductively coupled, plate-shaped p Plasma source for generating inductively coupled, plate-shaped p

1997-07-16

2000-06-27

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723I, 118723AN, C23F 102

Patent

active

060802715

ABSTRACT:
The arrangement comprises an antenna coil disposed close to a cover 4 for a Plasma forming chamber 3 and having one side surface opposed to the chamber space of said plasma forming chamber, a magnetically permeable core 7 of ferromagnetic material whose lower surface opposed to said chamber space is formed with a groove 7a in which the conductor of said antenna coil is received, and a susceptor 16 disposed in the lower region of said chamber space for placing an object to be treated 19 thereon.

REFERENCES:
patent: 4740268 (1988-04-01), Bukhman
patent: 4948458 (1990-08-01), Ogle
patent: 5038013 (1991-08-01), Akazawa et al.
patent: 5475354 (1995-12-01), Valentian et al.
patent: 5792261 (1998-08-01), Hama et al.
Lee, J.T.C., "A Comparison of HDP Sources for Polysilicon Etching"--Solid State Technology, Aug. 1996.

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