Plasma sampling interface for inductively coupled plasma-mass sp

Details Plasma sampling interface for inductively coupled plasma-mass sp Plasma sampling interface for inductively coupled plasma-mass sp

1992-05-27

1993-06-08

Dzierzynski, Paul M.

Radiant energy

Ionic separation or analysis

With sample supply means

250281, 250289, 2504922, H01J 4910

Patent

active

052182045

ABSTRACT:
A plasma sampling interface for an inductively coupled plasma-mass spectrometry (ICP-MS) apparatus includes a sampler, a skimmer, insulating spacers for insulating the sampler and the skimmer from each other and from the remainder of the ICP-MS apparatus, and a DC bias voltage source for applying a DC bias voltage to the skimmer with the sampler either being grounded or being allowed to float. The plasma sampling interface increases the ion transmission through the ICP-MS apparatus by a factor of at least four to six over the ion transmission through a conventional ICP-MS apparatus in which both the sampler and the skimmer are grounded.

REFERENCES:
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patent: 4501965 (1985-02-01), Douglas
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D. J. Douglas, "Some Current Perspectives on ICP-MS", Canadian Journal of Spectrometry, vol. 34, No. 2, pp. 38-49, 1989.
M. Morita et al., "High Resolution Mass Spectrometry with Inductively Coupled Argon Plasma Ionization Source", Analytical Sciences, Oct. 1989, vol. 5, pp. 609-610.
N. Bradshaw et al., "Inductively Coupled Plasma as an Ion Source for High Resolution Mass Spectrometry", Journal of Analytical Atomic Spectrometry, Dec. 1989, vol. 4, pp. 801-803.

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