Plasma reactors

Details Plasma reactors Plasma reactors

1995-05-25

1997-07-15

Niebling, John

Coating apparatus

Gas or vapor deposition

With treating means

118723MP, 118723E, C23C 1600

Patent

active

056479131

ABSTRACT:
A plasma reactor includes, a) an electrically insulative shell forming a reactor cavity, the reactor cavity having internal walls; b) inductive coils positioned externally of the cavity; and c) a capacitive coupling plate positioned externally of the cavity intermediate the cavity and inductive coils, a power source being operably connected with the capacitive coupling plate. A method of cleaning away material adhering to internal walls of a plasma reactor includes, a) injecting a cleaning gas into the reactor, the cleaning gas comprising a species which when ionized is reactive with material adhering to the internal plasma reactor walls; and b) generating a capacitive coupling effect between a pair of conductors, at least one of which is positioned externally of the plasma reactor, effective to both ionize the cleaning gas into the reactive ionized species and draw such ionized species in the direction of the external conductor to impact and clean away material adhering to the reactor internal walls. A combination dry etching and cleaning process is also disclosed.

REFERENCES:
patent: 4786352 (1988-11-01), Benzing
patent: 4786392 (1988-11-01), Kruchowski et al.
patent: 4795880 (1989-01-01), Hayes et al.
patent: 5234529 (1993-08-01), Johnson
patent: 5252178 (1993-10-01), Moslehi
patent: 5269881 (1993-12-01), Sekiya et al.
patent: 5277751 (1994-01-01), Ogle
patent: 5346578 (1994-09-01), Benzing et al.

Affiliated with

Also associated with

Rating

Plasma reactors does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma reactors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma reactors will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1489812