Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...
Patent
1985-02-05
1986-07-15
Gron, Teddy S.
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
With means applying electromagnetic wave energy or...
42218605, 42218606, 204298, 156345, B01J 1908, B01J 1912
Patent
active
046005633
ABSTRACT:
A plasma reactor comprises a working chamber, the chamber being adapted to receive at least one article and a volume of plasma which is capable of interacting with a material of the article. A pair of electrodes are positioned about the chamber. Further, a radio-frequency generator is provided. More particularly, the plasma reactor includes a radio-frequency voltage transformer. The transformer includes a primary winding that is connected to the generator and a secondary winding the center of which is grounded. The secondary winding is adapted to transform the energy received from the primary winding into plasma-exciting energy at the electrodes, whereby the voltage between the plasma and the ground is small such that voltage discharge between the plasma and any grounded parts is minimized.
REFERENCES:
patent: 3440418 (1969-04-01), Piazza
patent: 3514393 (1970-05-01), Eisby
patent: 3671195 (1972-06-01), Bersin
patent: 3816196 (1974-06-01), La Combe
patent: 3875068 (1975-04-01), Mitzel
patent: 4182646 (1980-01-01), Zajac
patent: 4230515 (1980-10-01), Zajac
patent: 4253907 (1981-03-01), Parry
patent: 4304983 (1981-12-01), Pierfederici
"Design Criteria for Uniform Reaction Rates in an Oxygen Plasma", IEEE Transactions on Electron Devices, 24, p. 140, Feb. 1977.
"The Reduction of Photoresist Stripping Rates in an Oxygen Plasma by By-Product Inhibition and Thermal Mass", Journal of the Electrochemical Society, 124, p. 147, Jan. 1977.
"The Effects of Geometry on Diffusion Controlled Chemical Reaction Rates in a Plasma", Journal of the Electrochemical Society, 124, p. 437, Mar. 1977.
"The Ultimate By-Products of Stripping Photoresist in an Oxygen Plasma", Journal of the Electrochemical Society, 124, p. 1926, Dec. 1977.
"Techniques and Applications of Plasma Chemistry", John R. Hollahan and Alexis T. Bell, chapter 9 Applications of Plasma Technology to the Fabrication of Semiconductor Devices by Ralph W. Kirk (New York, John Wiley & Sons, 1974).
Gron Teddy S.
Psi Star Incorporated
Wolffe S.
LandOfFree
Plasma reactor with voltage transformer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma reactor with voltage transformer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma reactor with voltage transformer will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1740246