Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...
Patent
1987-04-24
1988-12-27
Terapane, John F.
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
With means applying electromagnetic wave energy or...
42218606, 422906, 204298, 156345, 2191214, 21912143, B01J 1908, C23C 1500, C23F 102
Patent
active
047939753
ABSTRACT:
A parallel plate plasma reactor is disclosed in which the lower electrode comprises a metal electrode having a central pedestal and an insert for surrounding the pedestal and holding wafers in contact with the pedestal or in position above the pedestal. The insert can comprise an insulator, such as ceramic, or a metal.
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Tegal Corporation
Terapane John F.
Wille Paul F.
Wolffe Susan
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