Plasma reactor with a deposition shield

Details Plasma reactor with a deposition shield Plasma reactor with a deposition shield

1998-12-01

1999-12-28

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723AN, 156345, C23C 1600, C23F 102

Patent

active

060066946

ABSTRACT:
A reactor 20 includes a shield 50 which prevents the deposition of materials along a line-of-sight path from a wafer 26 toward and onto an electrode 32, or a window 38 which couples an electrode 32 to a reaction chamber of the reactor 20. The shield can be comprised of a conductor and/or an insulator. The shield can affect the character of a plasma generated in the reactor.

REFERENCES:
patent: 3514391 (1970-05-01), Hablanian et al.
patent: 5804046 (1998-09-01), Sawada et al.
patent: 5837057 (1998-11-01), Koyama et al.

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