Plasma reactor having slotted manifold

Details Plasma reactor having slotted manifold Plasma reactor having slotted manifold

1984-12-24

1986-05-20

Terapane, John F.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

42218605, 42218604, 204298, 204192E, 156345, B01J 1908, C23C 1400, C23F 102

Patent

active

045900426

ABSTRACT:
A plasma reactor apparatus is disclosed in which plates having channels are used to redistribute gas uniformly over the surface of a wafer being processed in the reactor. Slot means adjacent the plates provide a final baffle to prevent jetstreams in the gas from impinging directly on the wafer.

REFERENCES:
patent: 4209357 (1980-06-01), Gorin et al.
patent: 4313783 (1982-02-01), Davies et al.
patent: 4534816 (1985-08-01), Chen et al.

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