Plasma reactor for the treatment of large size substrates

Details Plasma reactor for the treatment of large size substrates Plasma reactor for the treatment of large size substrates

2007-03-27

2010-02-16

Hassanzadeh, Parviz (Department: 1792)

Coating apparatus

Gas or vapor deposition

With treating means

Reexamination Certificate

active

07661388

ABSTRACT:
A radiofrequency plasma reactor (1) for the treatment of substantially large sized substrates is disclosed, comprising between the electrodes (3, 5) of the plasma reactor a solid or gaseous dielectric layer (11) having a non planar-shaped surface-profile, said profile being defined for compensating a process non uniformity in the reactor or generating a given distribution profile.

REFERENCES:
patent: 5210466 (1993-05-01), Collins et al.
patent: 5685949 (1997-11-01), Yashima
patent: 6177023 (2001-01-01), Shang et al.
patent: 61238981 (1986-10-01), None
patent: 07003133 (1995-01-01), None
patent: 08186094 (1996-07-01), None

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