Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1981-08-11
1983-08-16
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
156643, 204298, C23C 1500
Patent
active
043990142
ABSTRACT:
A plasma reactor includes a plurality of series of parallel disposed cylindrical electrodes carried in a common vacuum vessel chamber. The series of electrodes are adapted to provide alternate polarities on each side of a plurality of workpieces, such as printed circuit boards, enclosed in the reactor for treatment. Supporting brackets are provided for positioning the workpieces, parallel to and between planes formed by series of electrodes of alternate polarities. The supporting brackets are electrically isolated from the electrodes.
REFERENCES:
patent: 2891530 (1975-06-01), Glaser et al.
patent: 3414503 (1968-12-01), Brichard
patent: 4178877 (1979-12-01), Kudo
patent: 4222839 (1980-09-01), Goodner et al.
patent: 4230553 (1980-10-01), Bartlett et al.
patent: 4277321 (1981-07-01), Bartlett et al.
patent: 4285800 (1981-08-01), Welty
patent: 4287851 (1981-09-01), Dozier
patent: 4289598 (1981-09-01), Engle
patent: 4298153 (1981-09-01), Kudo et al.
LandOfFree
Plasma reactor and method therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma reactor and method therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma reactor and method therefor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-813573