Plasma reactor and method therefor

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating

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156643, 204298, C23C 1500

Patent

active

043990142

ABSTRACT:
A plasma reactor includes a plurality of series of parallel disposed cylindrical electrodes carried in a common vacuum vessel chamber. The series of electrodes are adapted to provide alternate polarities on each side of a plurality of workpieces, such as printed circuit boards, enclosed in the reactor for treatment. Supporting brackets are provided for positioning the workpieces, parallel to and between planes formed by series of electrodes of alternate polarities. The supporting brackets are electrically isolated from the electrodes.

REFERENCES:
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patent: 3414503 (1968-12-01), Brichard
patent: 4178877 (1979-12-01), Kudo
patent: 4222839 (1980-09-01), Goodner et al.
patent: 4230553 (1980-10-01), Bartlett et al.
patent: 4277321 (1981-07-01), Bartlett et al.
patent: 4285800 (1981-08-01), Welty
patent: 4287851 (1981-09-01), Dozier
patent: 4289598 (1981-09-01), Engle
patent: 4298153 (1981-09-01), Kudo et al.

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