Plasma reactor

Details Plasma reactor Plasma reactor

1989-06-26

1990-08-07

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 156646, 20429837, 20429838, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

049465376

ABSTRACT:
A plasma reactor includes a chamber, a specimen such as a wafer or the like supported in the chamber, a device for generating a plasma in the chamber, and at least one electromagnetic coil disposed coaxially around the chamber. The specimen is supported parallel to a magnetic field generated by the electromagnetic coil. High-density and high-energy charged particles in the plasma collide perpendicularly with the surface of the specimen to treat the specimen by way of etching or the like.

REFERENCES:
patent: 4559100 (1985-12-01), Ninomiya et al.
patent: 4668338 (1987-05-01), Maydan et al.
patent: 4738761 (1988-04-01), Bobbio et al.
patent: 4829215 (1989-05-01), Kim et al.

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