Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1996-12-23
1999-10-26
Breneman, Bruce
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
118718, 118723R, 118730, 24236412, 2423642, 2423661, B01J 1908
Patent
active
059721600
ABSTRACT:
The invention relates to a plasma reactor for flexible strand material (12) , comprising passages (20,22) for the strand material (12) to enter into and exit from the reactor chamber (16), electrodes (54,56,58,60) arranged in the reactor chamber (16) for generating a plasma, and at least one guiding element arranged in the reactor chamber (16) and being adapted to guide the strand material (12) along a processing path. In order to provide a compact plasma reactor (10) for flexible strand material (12) which permits a uniform and gentle processing of the flexible strand material (12), it is provided, according to the invention, that at least one guiding element is a roller (24,26) about which the strand material (12) revolves in several windings axially offset with respect to each other, and that the electrodes (54,56,58,60) are arranged such that the plasma generated by them simultaneously acts on portions (62) of at least two windings axially offset with respect to each other.
REFERENCES:
patent: 2155324 (1939-04-01), Moritz
patent: 2267402 (1941-12-01), Helm
patent: 2532562 (1950-12-01), Lorig
patent: 2567233 (1951-11-01), Lorig
patent: 2614313 (1952-10-01), Reitsma
patent: 2622860 (1952-12-01), Lorig
patent: 2658256 (1953-11-01), Van Dijck
patent: 2963233 (1960-12-01), Riegler
patent: 3709444 (1973-01-01), Tannert
patent: 3883960 (1975-05-01), Stang
patent: 3884787 (1975-05-01), Kuehnle
patent: 3959104 (1976-05-01), Fales
patent: 4013539 (1977-03-01), Kuehnle
patent: 4065101 (1977-12-01), Korbut
patent: 4437324 (1984-03-01), Sando et al.
patent: 4457145 (1984-07-01), Sando et al.
patent: 4728406 (1988-03-01), Banerjee et al.
patent: 4957061 (1990-09-01), Ando et al.
patent: 5439736 (1995-08-01), Nomura
patent: 5462602 (1995-10-01), Misiano et al.
patent: 5499774 (1996-03-01), Novak et al.
patent: 5595792 (1997-01-01), Kashiwaya et al.
Breneman Bruce
Olsen Allan
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