Plasma reaction chamber with a built-in magnetic core

Coating apparatus – Gas or vapor deposition – Multizone chamber

Reexamination Certificate

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C118S7230AN, C118S7230ER, C156S345310, C156S345320, C156S345430, C156S345440, C156S345450

Reexamination Certificate

active

07611585

ABSTRACT:
A plasma reaction chamber includes a chamber housing having two inner connection passages for connecting two vacuum chambers to other vacuum chambers. Two vacuum chambers and two inner connection passages form a continuous discharge path. At least one magnetic core is mounted in two vacuum chambers or two inner connection passages, and a coil connected to a power source is wounded around the magnetic core so as to transfer induced electromotive force to the continuous discharge path. The plasma reaction chamber is configured so that at least two vacuum chambers are integrated in a multiple arrangement, and common parts are shared in common, so that at least two substrates may be treated in parallel at the same time, thereby improving productivity per unit area and making it possible to construct a low-cost and high-efficient substrate treatment system.

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patent: 6132517 (2000-10-01), Sivaramakrishnan et al.
patent: 6375860 (2002-04-01), Ohkawa et al.
patent: 6380684 (2002-04-01), Li et al.
patent: 6435428 (2002-08-01), Kim et al.
patent: 6523493 (2003-02-01), Brcka
patent: 6635115 (2003-10-01), Fairbairn et al.
patent: 2002/0101167 (2002-08-01), Shan et al.
patent: 2002/0152960 (2002-10-01), Tanaka et al.

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