Plasma processor electrode and plasma processor

Details Plasma processor electrode and plasma processor Plasma processor electrode and plasma processor

2003-03-27

2010-11-09

Zervigon, Rudy (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345330, C156S345340, C156S345430, C156S345440

Reexamination Certificate

active

07827931

ABSTRACT:
A plasma processor electrode includes a support member disposed to face to an electrode that holds a substrate to be treated, an electrode plate fixed to the support member and equipped with gas injection holes and a screw hole open and facing to the support member to supply a processing gas through the gas discharge hole into a processing space formed between the electrode plate and the electrode to generate a plasma in the processing space, and a fastening unit that clamps the electrode plate on the support member by fastening the electrode plate to the support member with a screw driven into the screw hole from the support member.

REFERENCES:
patent: 3456549 (1969-07-01), Horton
patent: 4324036 (1982-04-01), Reilly
patent: 5766364 (1998-06-01), Ishida et al.
patent: 6036782 (2000-03-01), Tanaka et al.
patent: 6700089 (2004-03-01), Hirooka
patent: 202904 (1988-11-01), None
patent: 11-162940 (1999-06-01), None

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