Radiation imagery chemistry: process – composition – or product th – Imaged product – Multilayer
Patent
1991-01-31
1993-05-25
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaged product
Multilayer
430 16, 430313, 430315, 430324, G03F 700
Patent
active
052139174
ABSTRACT:
This invention describes methods for altering a substrate in a fine line image pattern using a microlithographic process including formation of a metal mask over a photoresist coating to protect the photoresist coating during dry development of the same. The invention also describes a method for formation of the metal mask. Briefly stated, the process of the invention comprises the steps of coating a substrate with a photoresist coating, exposing the photoresist coating so formed to a desired pattern of actinic radiation, catalyzing the entire surface of the photoresist coating with an electroless plating catalyst, developing the photoresist layer to a depth at least sufficient to remove the undesired catalyst layer in an image pattern, forming a metal pattern on the desired (remaining) catalyst layer and dry developing the remaining photoresist coating unprotected by the metal mask.
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Gulla Michael
Sricharoenchaikit Prasit
Corless Peter F.
Duda Kathleen
Goldberg Robert L.
Hamilton Cynthia
Shipley Company Inc.
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