Coating apparatus – Gas or vapor deposition – With treating means
Patent
1999-01-22
2000-08-15
Dang, Thi
Coating apparatus
Gas or vapor deposition
With treating means
118723E, 118723ER, 118723HC, 156345, H05H 100
Patent
active
061019720
ABSTRACT:
A substrate processing system includes a processing chamber, a substrate holder positioned in the chamber, a gas source for supplying a process gas to the chamber, at least one ion source located in the chamber, and a power source for energizing the ion source by positively biasing the anode and negatively biasing the cathode, the bias in each instance being relative to the chamber. The ion source ionizes the process gas producing ions for processing a substrate disposed on a substrate holder in the chamber. One embodiment includes two such ion sources. In this case, the power source energizes the first and second anodes and the cathodes in a time multiplexed manner, such that only one of the first or second ion sources is energized at any time and interactions between ion sources are eliminated.
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Bluck Terry
Rogers James H.
Xie Jun
Cole Stanley Z.
Dang Thi
Intevac, Inc.
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