Plasma processing system and apparatus and a sample...

Details Plasma processing system and apparatus and a sample... Plasma processing system and apparatus and a sample...

2007-01-30

2007-01-30

Kackar, Ram N. (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C156S345470, C156S345250, C118S712000, C118S7230ER, C118S713000, C216S067000, C438S710000, C356S445000

Reexamination Certificate

active

10732285

ABSTRACT:
A plasma processing apparatus having a sample stage disposed inside a vacuum chamber and a plate member disposed opposing to a sample which is placed on the sample stage and supplied with electric power. The sample is processed using a plasma generated between the sample stage and the plate member and a measuring port is disposed at a back side of the plate member. The measuring port includes an optical transmitter which receives light from a surface of the sample, and a seal which vacuum-seals between an atmospheric side and vacuum side of the vacuum chamber.

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